The Glass Substrates Had Zno Thin Films Produced on Them Using a Sol-Gel Dip Coating
Process. All Sorts of Temperatures, from 350 to 550 Degrees Celsius, Were Used to Anneal the Films. The
Impact of Annealing Temperature on the Films' Structural and Morphological Features Was Studied Using
X-Ray Diffraction (Xrd) and Atomic Force Microscopy (Afm). Different Processing Conditions Are Used
During Manufacturing, All of Which Might Alter the Final Attributes of a Device Based on Amorphous
Oxides. Although Zinc Oxide Shows Promise As a Transparent Amorphous Oxide, Its Structure Is Sensitive
To Temperature Changes. Here, We Looked at the Phenomenon of Surface Recrystallization In Amorphous
Zinc Oxide Layers Produced By Pulsed Laser Deposition Onto Fused Silica, Sapphire, and Si Substrates.
Extremely Out-Of-Equilibrium Phase Structures Were Found In the Three-Layer Preparation. All The
Developed Zno Films Display Strongly (0001)-Oriented Patterns Without In-Plane Rotation, As Evidenced By
In Situ Reflection High-Energy Electron Diffraction (Rheed) and Ex Situ X-Ray Diffraction (Xrd). As
Evidenced By Atomic Force Microscopy (Afm) Pictures, “Ridge-Like” and “Particle-Like” Surface
Morphologies Are Found For the Zno Films Formed In a Molecular O2 Environment With and Without An
Initial Deposition of Zn Adatoms, Respectively, Before Zno Development With Oxygen Plasma. the Ultimate
Surface Shape and Optical Characteristics of the Zno Film Are Significantly Affected By This Artificially
C ...